要求 | Qualifications: 物理、光学、计算机科学、化学工程、材料科学、数学等相关专业，硕士及以上学历。Master's degree or above in Physics, Optics, Computer Science, Chemical Engineering, Materials Science, Mathematics, or related disciplines. 熟悉OPC以及光刻技术。Solid knowledge of Optical Proximity Correction (OPC) and lithography technologies. 有良好的问题分析和解决能力。Strong analytical and problem-solving skills. 良好的沟通、计划组织、协作以及人员/项目领导能力。Excellent communication, planning, organizational, collaboration, and project leadership capabilities. 较强的人际交往能力以及在不同环境的工作适应能力。Strong interpersonal skills and the ability to adapt effectively to different working environments. 流利的英语表达能力。Fluent English communication skills, both written and verbal. 有掩膜版设计制造、物理版图设计、光刻及其它晶圆处理工艺方面背景优先。Experience in mask design and manufacturing, physical layout design, lithography, or other wafer processing technologies is highly preferred.